V. Sushkov, S. Handelshauser, G. Franz:
Properties of an ECWR Discharge at Low Pressures
IEEE Trans. Plasma Sci., published July 03, 2019,
https://doi.org/10.1109/TPS.2019.2923548
G. Franz, R. Meyer, M.-C. Amann:
Correlation of III/V semiconductor etch results with physical parameters of
high-density reactive plasmas excited by electron cyclotron resonance
Plasma Sci. Technol. 19, 125503 (2017)
F. Schamberger, I. Krstev, S. Umrath, G. Franz:
Recording spatially resolved plasma parameters in microwave-driven plasmas
Plasma Sci. Technol. 15, 43 (2013)
G. Franz, F. Rauter, S. Dribinskiy:
Characterization of microwave plasmas for deposition of polyparylene
J. Vac. Sci. Technol. A 27, 1035 (2009)
Q. Wang, F. Doll, V.M. Donnelly, D.J. Economou, N. Sadeghi, G. Franz:
Experimental and theoretical study of the effect of gas flow on gas temperature in an atmospheric
pressure microplasma
J. Phys. D: Appl. Phys. 40, 4202 (2007)
A. Ranjan, C. Helmbrecht, V.M. Donnelly, D.J. Economou, G. Franz:
Effect of surface roughness of the neutralizer grid on the energy and flux of residual ions and fast neutrals
extracted from a neutral beam source
J. Vac. Sci. Technol. B 25, 258 (2007)
G. Franz:
Some Aspects of Energy Dissipation in Capacitively Coupled Discharges and Reactive Gases
J. Vac. Sci. Technol. A 24, 1360 (2006)
G. Franz, M. Klick:
Electron Heating in Capacitively Coupled Discharges and Reactive Gases
J. Vac. Sci. Technol. A 23, 917 (2005)
G. Franz:
Comprehensive Analysis of Capacitively Coupled Chlorine-Containing Discharges
J. Vac. Sci. Technol. A 23, 369 (2005)
G. Franz, A. Kelp, P. Meßerer:
Analysis of Chlorine-Containing Plasmas Etching Ga-Containing III/V Semiconductors
J. Vac. Sci. Technol. A 18, 2053 (2000)
M. Klick, M. Kammeyer, W.Rehak, W. Kasper, P. Awakowicz, G. Franz:
Innovative Plasma Diagnostics and Control of Process in Reactive
Low-Temperature Plasmas
Surf. Coat. Technol. 98, 1395 (1998)
G. Franz, W. Oberhausen, R. Meyer, M.-C. Amann:
E. Deichsel, G. Franz:
G. Franz, R. Kachel, S. Sotier:
G. Franz, W. Hösler, R. Treichler:
G. Franz, F. Rinner:
G. Franz:
G. Franz:
G. Franz:
G. Franz, C. Hoyler, J. Kaindl:
J. Kaindl, S. Sotier, G. Franz:
G. Franz:
G. Franz:
Residual-free reactive ion etching of gold layers
AIP Advances 8, 075026 (2018); doi: 10.1063/1.5037886
Fabrication of Dry Etched and Subsequently Passivated Laser Facets in GaAs/AlGaAs
J. Vac. Sci. Technol. A 22, 2201 (2004)
Residual-Free Reactive Ion Etching of the Bell Contact
Materials Science in Semiconductor Processing 5, 45 (2002)
Side Wall Passivation of GaAs in Cl-Containing Plasmas
J. Vac. Sci. Technol. B 19, 415 (2001)
Reactive Ion Etching of GaN and GaAs: Radially Uniform Processes for
Rectangular, Smooth Sidewalls
J. Vac. Sci. Technol. A 17, 56 (1999)
Surface Roughening of SiC and Ga-Containing Semiconductors in
High-Frequency Reactive Plasmas
Materials Science in Semiconductor Processing 2, 349 (1999)
High-Rate Etching of GaAs Using Chlorine Atmospheres Doped with a Lewis Acid
J. Vac. Sci. Technol. A 16, 1542 (1998)
Hydrogen in Dry Etching Processes
phys. stat. sol. (a) 159, 137 (1997)
Reactive Ion Etching of GaAs and InP: Kinetics and Process Monitoring
J. Vac. Sci. Technol. B 14, 126 (1996)
Dry Etching of III/V-Semiconductors:
Fine Tuning of Pattern Transfer and Process Control
J. Electrochem. Soc. 142, 2418 (1995)
Robust Reactive Ion Etching Processs for GaAs/AlGaAs/AlAs
by Application of Statistical Concepts
J. Electrochem. Soc. 140, 1147 (1993)
Reactive Ion Etching of III/V Semiconductors Using Carbon Containing
Gases - A Comprehensive Statistical Approach
J. Electrochem. Soc. 137, 2896 (1990)
G. Franz:
Damage in III/V Semiconductors Caused by Hard- and Soft-Etching Plasmas
J. Vac. Sci. Technol. A 19, 762 (2001)
G. Franz, R. Averbeck, M. Auer, J. Lorenz:
Damage in III/V Semiconductors Caused by Hard- and Soft-Etching Plasmas
2000 5th Internat. Sympos. Plasma-Process-Induced Damage Conf. Band,
ed. by M. Koyanagi, M. Engelhardt, C.T. Gabriel, publ. by AVS, May 2000
G. Franz, R. Averbeck:
Plasma-Induced Damage in Doped InGaN/GaN Heterostructures
Inst. Phys. Conf. Ser. 166, 479 (2000)
M. Heinbach, J. Kaindl, G. Franz:
Lattice Damage in III/V Compound Semiconductors by Dry Etching
Appl. Phys. Lett. 67, 2034 (1995)
M. Steib, Y. Vandyshev, R. Johnson, G. Franz, H. Deng:
Effects of optical back reflection on long wavelength VCSELs
SPIE Proc. 6132, 613205 (2006)
E. Deichsel, G. Franz:
Fabrication of Dry Etched and Subsequently Passivated Laser Facets in GaAs/AlGaAs
J. Vac. Sci. Technol. A 22, 2201 (2004)
A. Rast, T.W. Johannes, W. Harth, G. Franz:
A New Gain-Coupled DFB-Laser with a Contacted Surface Loss-Grating for l = 1.55 micrometer
IEE Proc.-Optoelectron. 142, 162 (1995)
B. Borchert, K. David, B. Stegmüller, R. Gessner, M. Beschorner, D. Sacher, G. Franz:
1.55 micrometer Gain-Coupled Quantum-Well Distributed Feedback Lasers with High Single-Mode Yield and Narrow Linewidth
IEEE Photonics Technology Letters 3, 955 (1991)
B. Stegmüller, H. Westermeier, W. Thulke, G. Franz, D. Sacher:
Surface Emitting InGaAsP/InP Distributed Feedback Laserdiode at 1.53 micrometer
with Monolithic Integrated Microlens
IEEE Photonics Technology Letters 3, 776 (1991)
B. Stegmüller, H. Westermeier, W. Thulke, G. Franz, D. Sacher:
High-Performance 1.53 micrometer InGaAsP/InP Surface Emitting Distributed Feedback Laser Diodes
with Monolithic Integrated Microlens
LEOS Proc. Th D.4, 55 1991)
R. Schimpe, B. Bauer, C. Schanen, G. Franz, G. Kristen, S. Pröhl:
1.5 micrometer InGaAsP Tilted Buried-Facet Optical Amplifier
Technical Digest Series 10, CFK5 (1991)
B. Stegmüller, R. Gessner, M. Beschorner, G. Franz, D. Sacher, B. Borchert:
Low Threshold Current MOVPE Grown GaInAs/Al(Ga)InAs Separate Confinement
Heterostructure Multiquantum Well Metal-Clad Ridge-Waveguide Lasers
Emitting at 1585 nm
IEEE Photonics Technology Letters 2, 609 (1990)
G. Franz, M.-C. Amann:
Extremely Low Contact Resistivity of Ti/Pt/Au Contacts on p+-InGaAs
as Determined by a New Evaluation Method
J. Electrochem. Soc. 140, 847 (1993)
G. Franz, M.-C. Amann, W. Thulke, R. Weber, R. Kaumanns:
Comparison of Silica- and Alumina-Based Spin-on Sources for
p-Contact Diffusion into InGaAs
Japn. J. Appl. Phys. 29, L712 (1990)
G. Franz, M.-C. Amann:
Reliable Spin-on Source for Acceptor Diffusion into III/V Compound Semiconductors
J. Electrochem. Soc. 136, 2410 (1989)
M.-C. Amann, G. Franz:
Improved Shallow p+-Diffusion into InGaAsP by a New Spin-on Diffusion Source
J. Appl. Phys. 62, 1541 (1987)
D.S. Redka, M. Buttberg, G. Franz:
Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes
Processes 10, 1982 (2022)
https://doi.org/10.3390/pr10101982
S.F. Bröskamp, G. Franz, D. Jocham:
Internal Coating of Ureteral Stents with Chemical Vapor Deposition of Parylene
Coatings 11, 739 (2021)
https://doi.org/10.3390/coatings11060739
G. Franz:
Plasma Enhanced Chemical Vapor Deposition of Organic Polymers
Processes 9, 980 (2021)
https://doi.org/10.3390/coatings11060739
G. Franz, F. Schamberger, H. Heidari Zare, S.F. Bröskamp, D. Jocham:
Bi-layer sandwich film for antibacterial catheters
Beilstein Journal of Nanotechnology 8, 1982 (2017)
S.F. Bröskamp, D. Redka, A. Möhlmann, G. Franz, D. Jocham:
Chemical Vapor Deposition of poly-p-xylylene in narrow tubes
AIP Advances 7, 075005 (2017)
A. Reichel, G. Franz, M.-C. Amann:
Chemical Vapor Deposition of Parylenes - Chemical and Physical Characterization
coatings 5, 142 (2015)
G. Franz, F. Schamberger:
Evaporation and thermal cracking of dimeric parylenes
J. Vac. Sci. Technol. A 31, 061602 (2013)
F. Schamberger, A. Ziegler, G. Franz:
Influence of Film Thickness and CVD Deposition Rate on Surface Quality of Polyparylene Coatings
J. Vac. Sci. Technol. B 30, 051801 (2012)
D.S. Redka, M. Buttberg, G. Franz:
Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes
Processes 10, 1982 (2022)
https://doi.org/10.3390/pr10101982
S.F. Bröskamp, G. Franz, D. Jocham:
Internal Coating of Ureteral Stents with Chemical Vapor Deposition of Parylene
Coatings 11, 739 (2021)
https://doi.org/10.3390/coatings11060739
D. Kast, G. Franz, J.J. Senkevich:
Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
R. Soc. Open Sci. 8: 201921 (2021).
https://doi.org/10.1098/rsos.201921
G. Franz, F. Schamberger, H. Heidari Zare, S.F. Bröskamp, D. Jocham:
Bi-layer sandwich film for antibacterial catheters
Beilstein Journal of Nanotechnology 8, 1982 (2017)
S.F. Bröskamp, D. Redka, A. Möhlmann, G. Franz, D. Jocham:
Chemical Vapor Deposition of poly-p-xylylene in narrow tubes
AIP Advances 7, 075005 (2017)
H. Heidari Zare, V. Juhart, A. Vass, G. Franz, D. Jocham:
Efficacy of silver/hydrophilic poly(p-xylylene) on preventing bacterial
growth and biofilm formation in urinary catheters.
Biointerphases 12, 011001 1-10 (2017)
H. Heidari Zare, A. Vass, O. Düttmann, G. Franz, D. Jocham:
Silver ions eluted from partially protected silver nanoparticles.
Biointerphases 11, 031002 (2016)
A. Reichel, G. Franz, M.-C. Amann:
Chemical Vapor Deposition of Parylenes - Chemical and Physical Characterization
coatings 5, 142 (2015)
H. Heidari Zare, St. Sudhop, F. Schamberger, G. Franz:
Microbiological investigation of an antibacterial sandwich layer system
Biointerphases 9, 031002 (2014)
G. Franz, W. Oberhausen, R. Meyer, M.-C. Amann:
Residual-free reactive ion etching of gold layers
AIP Advances 8, 075026 (2018); doi: 10.1063/1.5037886
H. Heidari Zare, V. Juhart, A. Vass, G. Franz, D. Jocham:
Efficacy of silver/hydrophilic poly(p-xylylene) on preventing bacterial
growth and biofilm formation in urinary catheters.
Biointerphases 12, 011001 1-10 (2017)
N.A. Markwardt, H. Stepp, G. Franz, R. Sroka, M. Goetz, P. Zelenkov, A. Rühm:
Remission spectrometry for blood vessel detection during stereotactic biopsy of brain tumors.
J. Biophotonics 1 - 15 (2016), DOI 10.1002/jbio.201600193
H. Heidari Zare, A. Vass, O. Düttmann, G. Franz, D. Jocham:
Silver ions eluted from partially protected silver nanoparticles.
Biointerphases 11, 031002 (2016)
H. Heidari Zare, St. Sudhop, F. Schamberger, G. Franz:
Microbiological investigation of an antibacterial sandwich layer system
Biointerphases 9, 031002 (2014)
C. Strowitzki, G. Franz:
Influence of the Electrode Material and Structure on the Performance of a XeCl* Laser
IEEE Trans. Plasma Sci. PS-36, 181 (2008)
G. Franz:
Plasma-Roughening of Polished SiC Substrates
Materials Science in Semiconductor Processing 5/6, 525 (2003)
G. Franz, R. Kachel, S. Sotier:
Residual-Free Reactive Ion Etching of the Bell Contact
Materials Science in Semiconductor Processing 5, 45 (2002)
G. Franz, B. Lange, S. Sotier:
Characterization of Sputtered Indium Tin Oxide Layers as
Transparent Contact Material
J. Vac. Sci. Technol. A 19, 2514 (2001)
G. Franz, C. Hoyler, D. Sacher:
Wet Chemical Etching Behavior of Ga(Al)As and In(Ga)P(As) Layers
Japn. J. Appl. Phys. 30, 2693 (1991)
G. Franz:
Characterization of Gold Layers Selectively Plated by a Pulsed Current
Thin Solid Films 169, 105 (1989)
G. Franz:
Anodic Oxidation of InP Using a Citric Acid Based Solution
J. Appl. Phys. 63, 500 (1988)